New technique for 2D nano-semiconductor doping

Research team developes new doping technique for nano-semiconductor

New technique for 2D nano-semiconductor doping

New technique for 2D nano-semiconductor doping

SHARE:





2015.04.02

Researchers in the Sungkyunkwan University (SKKU) were able to develop a new  doping technique for 2D nano-semiconductor using only heat and light energy. Doping is a process of altering the characteristics of a semiconductor by adjusting the concentration of the electrons or holes into n type or p type.

Prof. Park Jin-hong of SKKU Electrical and Computer Engineering and his team, used a silicate on top with a thin molybdenum disulfide (MoS2) nano-semiconductor to experiment with heat and light energy in the process.

As a result, the experiment on controlling the concentration of the holes was successful. This is the equivalent of 100 times the range area that can be conducted by conventional doping techniques.

“ I am certain that through this new doping technique, untilizing light and heat energy, we will be  able to contribute to the progress of 2D nano-semicondutors” Prof. Park asserted. 

Microsoft
Development Category (English)728x90