Santa Rosa, Calif. – February 2, 2019 – Alluxa, Inc., a global leader in thin-film deposition technology and high-performance optical coatings and filters, is pleased to announce the production of a new class of multi-cavity ultra-narrow bandpass filters with 0.1 nm bandwidths and OD6 blocking.
An industry-leading manufacturer of ultra-narrow bandpass filters, Alluxa now offers a 532 nm multi-cavity filter that has a FWHM of just 0.1 nm while maintaining over 80% transmission. The innovative ultra-narrow filters have wide-ranging uses including improving signal-to-noise ratios in many fields such as Lidar for autonomous vehicles, astronomy, laser-line clean up, free-space communication, and fusion research.
Alluxa’s CCO Peter Egerton notes, “We are excited to have made a significant leap forward in the state of the art of high-performance optical bandpass filters. We are constantly working to push the limits of our proprietary SIRRUSTM plasma deposition process and this new filter is a perfect example. The ultra-narrow 0.1 nm filters are manufacturing-ready and we look forward to helping our customers get to the next level in system sensitivity.”
To learn more about Alluxa’s breakthrough optical coating technology and the 0.1 nm wide multi-cavity filter, please go to: www.alluxa.com or visit Alluxa’s booth #4482 at Photonics West 2019, Moscone Center, San Francisco, Feb. 5 - 7, 2019.
Alluxa (www.alluxa.com – Santa Rosa, CA) designs and manufactures next generation, hard-coated optical filters using a proprietary plasma deposition process. The company’s unique, purpose-built deposition platform and control systems were designed, developed, and built by our team to address the demanding requirements of the next generation of systems and instruments. Our objectives are to increase production capability and continue to provide > 99% on-time delivery while creating the world’s most challenging filters at breakthrough price points.